DocumentCode :
2290253
Title :
Multiscale modeling of nanoscale device fabrication
Author :
Dunham, Scott T.
Author_Institution :
Electr. Eng. Dept., Univ. of Washington, Seattle, WA, USA
fYear :
2010
fDate :
17-20 Aug. 2010
Firstpage :
85
Lastpage :
89
Abstract :
Density function theory calculations provide the foundation for hierarchical modeling of the processes controlling fabrication of nanoscale devices. The roles of atomistic methods in nanotechnology modeling are described and examples of their application given. The resulting physical models provide both deeper insight into the processes controlling device fabrication, as well as tools for technology development and optimization.
Keywords :
density functional theory; nanoelectronics; nanofabrication; nanophotonics; optical fabrication; process control; semiconductor process modelling; atomistic methods; density function theory calculations; hierarchical modeling; multiscale modeling; nanoscale electronic device; nanoscale photonic device; nanotechnology modeling; physical models; processes controlling fabrication;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
ISSN :
1944-9399
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
Type :
conf
DOI :
10.1109/NANO.2010.5698065
Filename :
5698065
Link To Document :
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