Investigation of bias-dependent series resistances and barrier height in Double Gate Schottky MOSFETs

This work reports on gate voltage dependent source and drain series resistance and associated barrier height in modified double gate Schottky MOSFETs with dopant segregation. We show that in our devices the series resistances is significantly reduced by lowering the Schottky barrier height (SBH). The series resistance and the barrier have been extracted using an external series resistance method and Arrhenius plots, respectively. Series resistances as low as 400 Omega.mum for V_G>V_T and SBH of 0.1 eV at V_G=V_T, are reported Finally, this paper points our the correlation of R_T(V_G) and Phi_B(V_G) in DG Schottky MOSFETs and the importance of the simultaneous extraction and modeling.