DocumentCode :
2291630
Title :
Improved Resistive Loading Profile for Ground-Penetrating Radar Antenna Applications
Author :
Guo, Yuchun ; Xu, Le ; Shi, Xiaowei
Author_Institution :
Sch. of Sci., Xidian Univ., Xi´´an
fYear :
2006
fDate :
16-19 Oct. 2006
Firstpage :
543
Lastpage :
546
Abstract :
One of the most critical hardware components for the performance of the GPR system is the antenna and the resistive loaded antenna is one of common antennas used in the GPR system. The author extends Wu-King linear current distribution to the double exponential current distribution and modifies the inaccurate part of the Wu-King loading profile and deduces an improved resistive loading profile with high efficiency. The broadband performance of the improved resistive loading profile has been studied; the concept of lengthening coefficient is created and the optimum parameter design curve of the antenna is provided. Numerical calculation shows that the maximum bandwidth and efficiency of antenna can be achieved with the improved loading profile simultaneously. The impedance bandwidth is as high as 40:1, which is much greater than the 3:1 bandwidth of Wu-King distribution when the voltage standing wave ratio is below 3. It exhibits better efficiency than Wu-King profile. The loading profile can reduce the late-time ringing and be widely applied to other resistive loading antenna for GPR applications
Keywords :
current distribution; ground penetrating radar; radar antennas; GPR system; double exponential current distribution; ground-penetrating radar antenna; impedance bandwidth; linear current distribution; numerical calculation; resistive loaded profile; Antenna accessories; Bandwidth; Broadband antennas; Current distribution; Ground penetrating radar; Hardware; Impedance; Loaded antennas; Radar antennas; Voltage; Resistive loading; Wu-King profiles; ground-penetrating radar (GPR) antenna; loading efficiency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radar, 2006. CIE '06. International Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-9582-4
Electronic_ISBN :
0-7803-9583-2
Type :
conf
DOI :
10.1109/ICR.2006.343219
Filename :
4148325
Link To Document :
بازگشت