• DocumentCode
    2291734
  • Title

    Wafer stacking: key technology for 3D integration

  • Author

    Lagahe-Blanchard, C. ; Aspar, B.

  • Author_Institution
    SOITEC, Parc Technol. des Fontaines, Crolles, France
  • fYear
    2009
  • fDate
    5-8 Oct. 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Wafer stacking technologies are today available for different 3D integration schemes. These are compatible with back end of line CMOS processes and packaging. Smart Stacking technology and copper to copper direct bonding processes were described as key technologies to realize dielectric or metallic bonding at room temperature and without applied pressure and/or additional glue layer. This results in a low stress stacked structure enabling high yield post process. Low temperature Smart Cuttrade is a third way to build 3D structures and bring opportunity to relax some stringent alignment constraints.
  • Keywords
    CMOS integrated circuits; cryogenic electronics; integrated circuit bonding; integrated circuit packaging; integrated circuit yield; silicon-on-insulator; 3D integration; 3D structures; CMOS process; IC packaging; SOI production; Si-SiO2; Smart Stacking technology; copper-to-copper direct bonding process; low-stress stacked structure; low-temperature Smart Cut; metallic bonding; wafer stacking; Bonding processes; CMOS process; CMOS technology; Copper; Dielectrics; Packaging; Stacking; Stress; Temperature; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 2009 IEEE International
  • Conference_Location
    Foster City, CA
  • ISSN
    1078-621X
  • Print_ISBN
    978-1-4244-4256-0
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2009.5318779
  • Filename
    5318779