DocumentCode :
2293876
Title :
Facial sketch synthesis using direct combined model
Author :
Tu, Ching-Ting ; Lien, Jenn-Jier James
Author_Institution :
Dept. of Comput. Sci. & Inf. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
fYear :
2010
fDate :
19-23 July 2010
Firstpage :
1196
Lastpage :
1201
Abstract :
Automatically synthesizing the facial sketches of a facial image is highly challenging since facial images typically exhibit a wide range of poses, expressions and scales, and have differing degrees of illumination and/or occlusion. When the facial sketches are to be synthesized in the unique sketching style of a particular artist, the problem becomes even more complex. This study develops an automatic facial sketch synthesis system based on a novel direct combined model (DCM) algorithm carrying three major advantages: First, DCM approach takes account of both the local details of each facial feature and the global geometric structure of the face, and thus the synthesized sketches more accurately mimic the caricatures drawn by the artist. Second, although the training database contains only full-frontal facial images with a neutral expression, sketches with a wide variety of facial poses, gaze directions and facial expressions can be successfully synthesized. Third, previous synthesizing proposals are heavily reliant on the quality of the texture reconstruction results, which in turn are highly sensitive to occlusion and lighting effects in the input image. DCM approach accurately produces lifelike synthesized facial sketches without the need to restore the texture information lost as a result of such unfavorable conditions.
Keywords :
eigenvalues and eigenfunctions; face recognition; image reconstruction; image texture; pose estimation; psychology; direct combined model algorithm; eigenface; facial expression; facial feature; facial image; facial pose; facial sketch synthesis; gaze direction; lifelike synthesized facial sketch; neutral expression; sketching style; Covariance matrix; Databases; Face; Facial features; Lighting; Shape; Training; Eigenface; Image processing and computer vision; face sketch synthesis; statistical image models;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Multimedia and Expo (ICME), 2010 IEEE International Conference on
Conference_Location :
Suntec City
ISSN :
1945-7871
Print_ISBN :
978-1-4244-7491-2
Type :
conf
DOI :
10.1109/ICME.2010.5583537
Filename :
5583537
Link To Document :
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