Title :
A RLS run-to-run control approach for semiconductor manufacturing process
Author :
Shujie Liu ; Ying Zheng ; Ming Luo ; Yanwei Wang
Author_Institution :
Dept. of Control Sci. & Eng., Univ. of Huazhong Sci.&Technol., Wuhan, China
Abstract :
Exponentially weighted moving average (EWMA) is a commonly used model-based algorithm for semiconductor manufacturing process Run-to-Run (R2R) control. However, it´s very difficult to set up the mathematical modeling for the actual semiconductor manufacturing process. Therefore, data-based methods such as Recursive Least Squares(RLS) have received wide attention nowadays. This paper proposes a variable forgetting factor RLS R2R control approach for semiconductor manufacturing process with and without drift disturbance. The variable forgetting factor resolves the drift disturbance well, and this method is much superior to generic RLS algorithm in convergence speed and tracking effect. It has both a strong ability to track parameters, and a small convergence estimate error. Simulation results prove the feasibility and accuracy of the algorithm.
Keywords :
mathematical analysis; semiconductor industry; actual semiconductor manufacturing process; data based method; drift disturbance well; exponentially weighted moving average; mathematical modeling; recursive least squares; run to run control; used model based algorithm; variable forgetting factor; Convergence; Equations; Manufacturing processes; Mathematical model; Process control; Semiconductor device modeling; RLS; Run-to-Run control; data-based method; drift disturbance; variable forgetting factor;
Conference_Titel :
Intelligent Control and Automation (WCICA), 2012 10th World Congress on
Conference_Location :
Beijing
Print_ISBN :
978-1-4673-1397-1
DOI :
10.1109/WCICA.2012.6358319