DocumentCode
2296361
Title
A RLS run-to-run control approach for semiconductor manufacturing process
Author
Shujie Liu ; Ying Zheng ; Ming Luo ; Yanwei Wang
Author_Institution
Dept. of Control Sci. & Eng., Univ. of Huazhong Sci.&Technol., Wuhan, China
fYear
2012
fDate
6-8 July 2012
Firstpage
2642
Lastpage
2646
Abstract
Exponentially weighted moving average (EWMA) is a commonly used model-based algorithm for semiconductor manufacturing process Run-to-Run (R2R) control. However, it´s very difficult to set up the mathematical modeling for the actual semiconductor manufacturing process. Therefore, data-based methods such as Recursive Least Squares(RLS) have received wide attention nowadays. This paper proposes a variable forgetting factor RLS R2R control approach for semiconductor manufacturing process with and without drift disturbance. The variable forgetting factor resolves the drift disturbance well, and this method is much superior to generic RLS algorithm in convergence speed and tracking effect. It has both a strong ability to track parameters, and a small convergence estimate error. Simulation results prove the feasibility and accuracy of the algorithm.
Keywords
mathematical analysis; semiconductor industry; actual semiconductor manufacturing process; data based method; drift disturbance well; exponentially weighted moving average; mathematical modeling; recursive least squares; run to run control; used model based algorithm; variable forgetting factor; Convergence; Equations; Manufacturing processes; Mathematical model; Process control; Semiconductor device modeling; RLS; Run-to-Run control; data-based method; drift disturbance; variable forgetting factor;
fLanguage
English
Publisher
ieee
Conference_Titel
Intelligent Control and Automation (WCICA), 2012 10th World Congress on
Conference_Location
Beijing
Print_ISBN
978-1-4673-1397-1
Type
conf
DOI
10.1109/WCICA.2012.6358319
Filename
6358319
Link To Document