• DocumentCode
    2297468
  • Title

    Simulation of Influence of AlGaN/GaN Heterojunction Parameters on Its Capacitance Curves

  • Author

    Osvald, J.

  • Author_Institution
    Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava
  • fYear
    2008
  • fDate
    12-16 Oct. 2008
  • Firstpage
    319
  • Lastpage
    322
  • Abstract
    We used the solution of the Poisson equation together with the drift and diffusion equations to simulate precisely the voltage dependence of the AlGaN/GaN capacitor structure. We demonstrate the influence of the structure parameters like doping concentrations of AlGaN, Schottky barrier height, and the thickness of the AlGaN layer on resulting C-V curve of the heterojunction capacitor. Also the capacitance of the structure in forward bias was simulated and the capacitance peak that sometimes occurs in the measurements was identified.
  • Keywords
    III-V semiconductors; Poisson equation; Schottky barriers; aluminium compounds; capacitance; gallium compounds; wide band gap semiconductors; AlGaN-GaN; Poisson equation; Schottky barrier height; capacitance curves; diffusion equations; drift equations; heterojunction parameters; voltage dependence; Aluminum gallium nitride; Capacitance; Capacitance-voltage characteristics; Capacitors; Doping; Gallium nitride; Heterojunctions; Poisson equations; Schottky barriers; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices and Microsystems, 2008. ASDAM 2008. International Conference on
  • Conference_Location
    Smolenice
  • Print_ISBN
    978-1-4244-2325-5
  • Electronic_ISBN
    978-1-4244-2326-2
  • Type

    conf

  • DOI
    10.1109/ASDAM.2008.4743348
  • Filename
    4743348