Title : 
Simulation of Influence of AlGaN/GaN Heterojunction Parameters on Its Capacitance Curves
         
        
        
            Author_Institution : 
Inst. of Electr. Eng., Slovak Acad. of Sci., Bratislava
         
        
        
        
        
        
            Abstract : 
We used the solution of the Poisson equation together with the drift and diffusion equations to simulate precisely the voltage dependence of the AlGaN/GaN capacitor structure. We demonstrate the influence of the structure parameters like doping concentrations of AlGaN, Schottky barrier height, and the thickness of the AlGaN layer on resulting C-V curve of the heterojunction capacitor. Also the capacitance of the structure in forward bias was simulated and the capacitance peak that sometimes occurs in the measurements was identified.
         
        
            Keywords : 
III-V semiconductors; Poisson equation; Schottky barriers; aluminium compounds; capacitance; gallium compounds; wide band gap semiconductors; AlGaN-GaN; Poisson equation; Schottky barrier height; capacitance curves; diffusion equations; drift equations; heterojunction parameters; voltage dependence; Aluminum gallium nitride; Capacitance; Capacitance-voltage characteristics; Capacitors; Doping; Gallium nitride; Heterojunctions; Poisson equations; Schottky barriers; Voltage;
         
        
        
        
            Conference_Titel : 
Advanced Semiconductor Devices and Microsystems, 2008. ASDAM 2008. International Conference on
         
        
            Conference_Location : 
Smolenice
         
        
            Print_ISBN : 
978-1-4244-2325-5
         
        
            Electronic_ISBN : 
978-1-4244-2326-2
         
        
        
            DOI : 
10.1109/ASDAM.2008.4743348