Title :
Characterisation and macro-modeling of patterned micronic and nano-scale dummy metal-fills in integrated circuits
Author :
Wane, Sidina ; Bajon, Damienne
Author_Institution :
NXP-Semicond. Campus-EffiScience, Caen, France
Abstract :
In this paper, a wideband characterization and macro-modeling of patterned micronic and nano-scale dummy metal-fills is presented. Impacts of patterned dummy metal-fill topologies including square, cross, vertical and horizontal shaped arrays on electrical performances (isolation/coupling, attenuation, guiding properties, etc...) are investigated. The validity of the proposed macro-modeling methodology is demonstrated by comparison with high frequency measurements of dedicated carrier structures including on-chip interconnects and RF inductive loops. An original extraction approach, based on local ground concept, is proposed to capture high frequency behaviour of dummy metal-fill in physics-based compact broadband SPICE model. The RLC parameters are accurately derived using fully scalable closed-form semi-analytical expressions.
Keywords :
RLC circuits; SPICE; arrays; coplanar transmission lines; coplanar waveguides; inductors; integrated circuit interconnections; nanoelectronics; radiofrequency integrated circuits; CPW transmission lines; RF inductive loops; RLC parameters; cross shaped array; guiding properties; horizontal shaped array; integrated circuits; integrated loops-RF-inductors; on-chip interconnects; patterned micronic metal-fills; patterned nanoscale dummy metal-fills; physics-based compact broadband SPICE model; square shaped array; vertical shaped array; wideband characterization; Circuit topology; Coplanar waveguides; Coupling circuits; Dielectrics; Integrated circuit interconnections; Pattern analysis; Power transmission lines; Radio frequency; Radiofrequency integrated circuits; Wideband; Broadband Scalable Macromodeling; Patterned Metal-Fills; Wideband SPICE model extraction;
Conference_Titel :
Radio Frequency Integrated Circuits Symposium, 2009. RFIC 2009. IEEE
Conference_Location :
Boston, MA
Print_ISBN :
978-1-4244-3377-3
Electronic_ISBN :
1529-2517
DOI :
10.1109/RFIC.2009.5135515