DocumentCode
2298595
Title
Fully integrated dual-band power amplifiers with on-chip baluns in 65nm CMOS for an 802.11n MIMO WLAN SoC
Author
Afsahi, Ali ; Behzad, Arya ; Magoon, Vikram ; Larson, Lawrence E.
Author_Institution
Broadcom Corp., San Diego, CA, USA
fYear
2009
fDate
7-9 June 2009
Firstpage
365
Lastpage
368
Abstract
Fully integrated dual-band power amplifiers with on-chip baluns for 802.11 n MIMO WLAN applications are presented. With a 3.3 v supply, the PAs produce a saturated output power of 28.3 dBm and 26.7 dBm with peak drain efficiency of 35.3% and 25.3% for the 2.4 GHz and 5 GHz bands, respectively. By utilizing multiple fully self-contained linearization algorithms, an EVM of -25 dB is achieved at 22.4 dBm for the 2.4 GHz band and 20.5dBm for the 5 GHz band while transmitting 54 Mbs OFDM. The chip is fabricated in standard 65 nm CMOS and the PAs occupy 0.31 mm2 (2.4 G) and 0.27 mm2 (5G) area.
Keywords
CMOS integrated circuits; MIMO communication; MMIC power amplifiers; OFDM modulation; system-on-chip; wireless LAN; 802.1 In MIMO WLAN SoC; CMOS; OFDM; bandwidth 2.4 GHz; bandwidth 5 GHz; fully integrated dual-band power amplifiers; multiple fully self-contained linearization algorithms; on-chip baluns; peak drain efficiency; saturated output power; size 65 nm; voltage 3.3 V; CMOS process; Costs; Dual band; Impedance matching; Linearity; MIMO; OFDM modulation; Packaging; Power amplifiers; Wireless LAN; 802.11n; CMOS; Linearization; MIMO; OFDM; Power Amplifier; WLAN;
fLanguage
English
Publisher
ieee
Conference_Titel
Radio Frequency Integrated Circuits Symposium, 2009. RFIC 2009. IEEE
Conference_Location
Boston, MA
ISSN
1529-2517
Print_ISBN
978-1-4244-3377-3
Electronic_ISBN
1529-2517
Type
conf
DOI
10.1109/RFIC.2009.5135559
Filename
5135559
Link To Document