Variation

Author

Boning, Duane ; Balakrishnan, Karthik ; Cai, Hong ; Drego, Nigel ; Farahanchi, Ali ; Gettings, Karen ; Lim, Daihyun ; Somani, Ajay ; Taylor, Hayden ; Truque, Daniel ; Xie, Xiaolin

Author_Institution

Microsyst. Technol. Labs., MIT, Cambridge, MA

fYear

2007

fDate

26-28 March 2007

Firstpage

15

Lastpage

20

Abstract

Variation afflicts the design, manufacture, and operation of integrated circuits. Statistical metrology seeks to characterize and model variations and their sources, particularly through new variation test circuits. Advanced process control attempts to reduce process variation through sensing and control during fabrication. Design for manufacturability seeks methods to improve performance and yield given process and environmental variation, through robust design, increased regularity, and other approaches. Tools and techniques are needed in all of these areas; improvements in and increased linkage between statistical metrology and DFM will be particularly important and empowering

Keywords

design for manufacture; integrated circuit testing; design for manufacturability; process control; process variation; statistical metrology; test circuits; Circuit testing; Couplings; Design for manufacture; Fabrication; Integrated circuit manufacture; Integrated circuit yield; Manufacturing processes; Metrology; Process control; Robustness;

fLanguage

English

Publisher

ieee

Conference_Titel

Quality Electronic Design, 2007. ISQED '07. 8th International Symposium on

Conference_Location

San Jose, CA

Print_ISBN

0-7695-2795-7

Type

conf

DOI

10.1109/ISQED.2007.165

Filename

4149005