• DocumentCode
    2302321
  • Title

    Model Of Plasma Immersion Ion Implantation For Voltage Pulses With Finite Rise- And Fall-times

  • Author

    Stewart, R.A. ; Lieberman, M.A.

  • Author_Institution
    University of California
  • fYear
    1991
  • fDate
    3-5 June 1991
  • Firstpage
    118
  • Lastpage
    118
  • Keywords
    Current density; Fabrication; Ion implantation; Numerical simulation; Plasma applications; Plasma density; Plasma immersion ion implantation; Semiconductor devices; Ultra large scale integration; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
  • Conference_Location
    Williamsburg, VA, USA
  • Print_ISBN
    0-7803-0147-1
  • Type

    conf

  • DOI
    10.1109/PLASMA.1991.695536
  • Filename
    695536
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2302321