Title :
A proposed textbook on industrial plasma engineering
Author_Institution :
University of Tennessee
Abstract :
Summary form only given. This presentation is a progress report on the author\´s textbook, "Industrial Plasma Engineering." This textbook is mtended for the senior or first-year graduate student, is comprehensive, presumes no pnor knowledge of plasma theory by the student, and is intended to be of value to students from a wide range of backgrounds in science and engineering. The poster presentation will feature a detailed topical outline of all 20 chapters of the book. The author hopes to increase the utility of the final vers10n of the text to potential users in universities and industry by exposing the topical outline to comments or criticism. The chapter headings of the proposed text are provided. The proposed text is arranged such that the first five chapters cover the basic principles of industrial plasma engineering; the next three chapters cover the ion, electron, and plasma sources which are common to industrial plasma technologies; chapters 10-14 cover the plasma processing of materials; and the last six chapters describe non-processing applications of plasmas to devices and technologies of industrial interest. The topical outline will be available for distribution at the meeting. A previous version of this outlinel has been the basis of a graduate-level course "Industrial Plasma Engineering" at UTK (University of Tennessee Knoxville) during the academic year 1989-1990. A revised course based on the present outline will be offered during academic year 1991-92 on the UTK campus, and by videotape in an 11-state area in the Southeast US.
Keywords :
Magnetic films; Nuclear and plasma sciences; Plasma applications; Plasma chemistry; Plasma properties; Plasma sources; Plasma temperature; Plasma transport processes;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695540