Title :
Extreme ultraviolet lasers demonstrate new nano-patterning schemes
Author :
Marconi, M.C. ; Wachulak, P. ; Urbanski, L. ; Menoni, C.S. ; Rocca, J.J. ; Isoyan, A. ; Jiang, F. ; Cheng, Y. ; Cerrina, F.
Author_Institution :
Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO, USA
Abstract :
Table-top extreme ultraviolet lasers at λ=46.9 allow compact photo-lithography systems utilizing coherent imaging techniques. Interferometric lithography, holographic lithography and Talbot lithography were demonstrated with sub-100 nm resolution in compact setups.
Keywords :
computer-generated holography; lasers; light interferometry; nanopatterning; photolithography; Talbot lithography; coherent imaging techniques; compact photolithography systems; extreme ultraviolet lasers; holographic lithography; interferometric lithography; nanopatterning; wavelength 46.9 nm;
Conference_Titel :
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-5368-9
DOI :
10.1109/PHOTONICS.2010.5698896
