Title :
Correlation of plasma properties and etching performance in a 25-cm diameter microwave multi-cusp ECR plasma reactor
Author :
Sze, F.C. ; Musson, B. ; Reinhard ; Asmussen, J.
Author_Institution :
Michigan State University
Keywords :
Etching; Inductors; Magnetic confinement; Plasma applications; Plasma confinement; Plasma density; Plasma materials processing; Plasma measurements; Plasma properties; Plasma sources;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695543
