• DocumentCode
    230347
  • Title

    A high-density logic CMOS process compatible non-volatile memory for sub-28nm technologies

  • Author

    Shen, Rick Shih-Jye ; Meng-Yi Wu ; Hsin-Ming Chen ; Lu, Chris Chun-Hung

  • Author_Institution
    eMemory Technol. Inc., JhuBei, Taiwan
  • fYear
    2014
  • fDate
    9-12 June 2014
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Various product applications bring up with increasing demands of logic NVM IP in advanced technology nodes. Encryption, security, functionality, and identification setting become indispensable in communication and high-end consumer electronics. A non-volatile memory cell, using anti-fuse programming mechanism to achieve high density and excellent data storage lifetime, is proposed. The unique cell design and operation scheme realize low programming-inhibit leakage current, fast program speed, and robust data retention. The memory macro is successfully demonstrated for one-time and multi-time programming applications with its full compatibility to sub-28nm and FinFET processes.
  • Keywords
    CMOS memory circuits; MOSFET; consumer electronics; leakage currents; random-access storage; FinFET process; OTP; antifuse programming mechanism; cell design; consumer electronics; data storage lifetime; high-density logic CMOS process; logic NVM IP; low programming-inhibit leakage current; nonvolatile memory cell; one-time programming; robust data retention; size 28 nm; Computer architecture; IP networks; Junctions; Logic gates; Microprocessors; Nonvolatile memory; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology (VLSI-Technology): Digest of Technical Papers, 2014 Symposium on
  • Conference_Location
    Honolulu, HI
  • ISSN
    0743-1562
  • Print_ISBN
    978-1-4799-3331-0
  • Type

    conf

  • DOI
    10.1109/VLSIT.2014.6894353
  • Filename
    6894353