Transferring Optical Proximity Correction (OPC) Effect into Optical Mode

Because of the ever-decreasing feature size in modern photolithography, the complexity of pattern increases dramatically and tape-out time becomes prolonged. It is desirable to transfer OPC process into optical model for the sake of time. In this report, we introduce a novel method of calculating the OPC effect by modifying the optical model, which is equivalent to transferring the OPC effect into the optical model