Title :
An Automated and Fast OPC Algorithm for OPC-Aware Layout Design
Author :
Chen, Ye ; Shi, Zheng ; Yan, Xiaolang
Author_Institution :
Inst. of VLSI Design, Zhejiang Univ., Hangzhou
Abstract :
To reduce design spin time, OPC-unfriendly spots in IC layout should be found out by designer before tape-out. This can be done by firstly running a "trial OPC" step on the layout, followed by running an OPC step to verify the result. In this paper we introduce a new OPC algorithm using an edge bias modeling method. When given a piece of sample post-OPC layout, software based on this algorithm can automatically correct a design with similar recipe but dozens of times faster than traditional model-based method, at cost of some accuracy loss. This makes the algorithm a good choice for "trial OPC"
Keywords :
integrated circuit layout; integrated circuit modelling; proximity effect (lithography); OPC algorithm; OPC-aware layout design; edge bias modeling method; post-OPC layout; trial OPC; Algorithm design and analysis; Bridges; Costs; Integrated circuit layout; Lighting; Manufacturing; Optical distortion; Optical losses; Software algorithms; Very large scale integration;
Conference_Titel :
Quality Electronic Design, 2007. ISQED '07. 8th International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
0-7695-2795-7
DOI :
10.1109/ISQED.2007.32