• DocumentCode
    2304170
  • Title

    Increasing Manufacturing Yield for Wideband RF CMOS LNAs in the Presence of Process Variations

  • Author

    Nieuwoudt, Arthur ; Ragheb, Tamer ; Nejati, Hamid ; Massoud, Yehia

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Rice Univ., Houston, TX
  • fYear
    2007
  • fDate
    26-28 March 2007
  • Firstpage
    801
  • Lastpage
    806
  • Abstract
    In this paper, the authors develop several design techniques for reducing the impact of manufacturing variations on integrated wideband low noise amplifiers (LNA). Utilizing an efficient modeling and automated design methodology, the authors investigate the sensitivity of LNA performance metrics to process variations and determine that the input impedance matching is particularly sensitive to perturbations in component values. Based on the sensitivity analysis, the authors leverage several design techniques to increase the reliability of LNA designs. To mitigate the impact of process variations on the input impedance matching, the authors add additional circuit elements and tunable capacitors to dynamically compensate for manufacturing variations after fabrication. The results indicate that the proposed design techniques can increase manufacturing yield by up to one order of magnitude for input impedance matching with only a 14% increase in noise figure
  • Keywords
    CMOS integrated circuits; impedance matching; low noise amplifiers; radiofrequency amplifiers; reliability; sensitivity analysis; automated design; impedance matching; integrated wideband low noise amplifiers; manufacturing yield; process variations; reliability; sensitivity analysis; tunable capacitors; wideband RF CMOS LNA; Broadband amplifiers; CMOS process; Impedance matching; Low-noise amplifiers; Manufacturing processes; Noise reduction; Pulp manufacturing; Radio frequency; Radiofrequency amplifiers; Wideband;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design, 2007. ISQED '07. 8th International Symposium on
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7695-2795-7
  • Type

    conf

  • DOI
    10.1109/ISQED.2007.89
  • Filename
    4149132