• DocumentCode
    2304177
  • Title

    Thermal nanoimprint fabrication of silicon high Q optical microdisk resonators

  • Author

    Schiavone, P. ; Chaix, N. ; Li, Q. ; Eftekhar, A. ; Yegnanarayanan, S. ; Adibi, A.

  • Author_Institution
    Georgia Tech, Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2010
  • fDate
    7-11 Nov. 2010
  • Firstpage
    417
  • Lastpage
    418
  • Abstract
    We demonstrate the fabrication of high Q microdisk resonators on an SOI platform using thermal nanoimprint lithography. The achieved Q factor is 60000 for 2μm radius disks. Arrays of 32 resonators show uniform spectral response.
  • Keywords
    Q-factor; elemental semiconductors; micro-optics; microcavities; nanolithography; nanophotonics; optical fabrication; optical resonators; silicon; silicon-on-insulator; spectral analysis; Q-factor; SOI platform; Si-SiO2; radius 2 mum; silicon optical microdisk resonators; spectral response; thermal nanoimprint fabrication; thermal nanoimprint lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    IEEE Photonics Society, 2010 23rd Annual Meeting of the
  • Conference_Location
    Denver, CO
  • ISSN
    -
  • Print_ISBN
    978-1-4244-5368-9
  • Electronic_ISBN
    -
  • Type

    conf

  • DOI
    10.1109/PHOTONICS.2010.5698937
  • Filename
    5698937
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2304177