DocumentCode :
2304177
Title :
Thermal nanoimprint fabrication of silicon high Q optical microdisk resonators
Author :
Schiavone, P. ; Chaix, N. ; Li, Q. ; Eftekhar, A. ; Yegnanarayanan, S. ; Adibi, A.
Author_Institution :
Georgia Tech, Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
2010
fDate :
7-11 Nov. 2010
Firstpage :
417
Lastpage :
418
Abstract :
We demonstrate the fabrication of high Q microdisk resonators on an SOI platform using thermal nanoimprint lithography. The achieved Q factor is 60000 for 2μm radius disks. Arrays of 32 resonators show uniform spectral response.
Keywords :
Q-factor; elemental semiconductors; micro-optics; microcavities; nanolithography; nanophotonics; optical fabrication; optical resonators; silicon; silicon-on-insulator; spectral analysis; Q-factor; SOI platform; Si-SiO2; radius 2 mum; silicon optical microdisk resonators; spectral response; thermal nanoimprint fabrication; thermal nanoimprint lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location :
Denver, CO
ISSN :
-
Print_ISBN :
978-1-4244-5368-9
Electronic_ISBN :
-
Type :
conf
DOI :
10.1109/PHOTONICS.2010.5698937
Filename :
5698937
Link To Document :
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