DocumentCode :
2304517
Title :
Modeling remote plasma enhanced CVD of Si/sub 2/N/sub 4/ using Rg/SiH/sub 4//NH/sub 3/ chemistries
Author :
Kushner, Mark J. ; YiIin Weng ; Sommerer, T.J.
Author_Institution :
University of Illinois
fYear :
1991
fDate :
3-5 June 1991
Firstpage :
123
Lastpage :
123
Keywords :
Chemical vapor deposition; Electrons; Gases; Hydrogen; Inductors; Plasma chemistry; Plasma materials processing; Plasma simulation; Plasma temperature; Roentgenium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
Type :
conf
DOI :
10.1109/PLASMA.1991.695549
Filename :
695549
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2304517
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