• DocumentCode
    2305209
  • Title

    Electroless Cu plated AlN substrate

  • Author

    Chiou, B.S. ; Chang, J.H.

  • Author_Institution
    Inst. of Electron., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • fYear
    1993
  • fDate
    1-4 Jun 1993
  • Firstpage
    1085
  • Lastpage
    1089
  • Abstract
    The metallization of AlN substrates by electroless Cu plating is investigated. Four-percent NaOH aqueous solution is employed as the chemical etchant before plating to study the correlation between the surface roughness and the adhesion strength of the etched substrates. Mechanical interlocking is suggested to be the major cause of the adhesion strength between the Cu and AlN substrate. Adhesion strength as high as 271 kg/cm2 is obtained for a polished-and-etched sample. The adhesion strength of the electroless Cu on the AlN substrate increases if the surface roughness of the AlN substrate is enhanced. The interfacial morphology of the Cu-plated AlN substrate is investigated and the adhesion mechanism is explored
  • Keywords
    adhesion; aluminium compounds; copper; electroless deposition; hybrid integrated circuits; integrated circuit metallisation; surface topography; AlN; Cu-AlN; adhesion mechanism; adhesion strength; electroless plating; hybrid ICs; interfacial morphology; mechanical interlocking; metallization; polished-and-etched sample; surface roughness; Adhesives; Circuits; Conducting materials; Copper; Etching; Metallization; Rough surfaces; Substrates; Surface morphology; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 1993. Proceedings., 43rd
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    0-7803-0794-1
  • Type

    conf

  • DOI
    10.1109/ECTC.1993.346700
  • Filename
    346700