DocumentCode :
2305297
Title :
Silicon-Germanium multi-quantum wells for extended functionality and lower cost integration
Author :
Onbasli, M. Cengiz ; Yesilyurt, Alper ; Yu, Hyun Yong ; Nayfeh, Ammar M. ; Okyay, Ali K.
Author_Institution :
Dept. of Mater. Sci. & Eng., Massachusetts Inst. of Technol., Boston, MA, USA
fYear :
2010
fDate :
7-11 Nov. 2010
Firstpage :
530
Lastpage :
531
Abstract :
Silicon-Germanium quantum wells were grown in p-i-n layers using a recently developed epitaxial technique. Nanostructural characterization (TEM, XPS, photoluminescence) indicates low-dislocation density, high quality films. Solar cells made of these layers have low leakage current.
Keywords :
X-ray photoelectron spectra; dislocation density; elemental semiconductors; epitaxial growth; germanium; leakage currents; photoluminescence; semiconductor growth; semiconductor quantum wells; silicon; solar cells; transmission electron microscopy; Si-Ge; TEM; XPS; dislocation density; epitaxial technique; extended functionality; leakage current; lower cost integration; multiquantum wells; nanostructural characterization; p-i-n layers; photoluminescence; solar cells;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location :
Denver, CO
ISSN :
-
Print_ISBN :
978-1-4244-5368-9
Electronic_ISBN :
-
Type :
conf
DOI :
10.1109/PHOTONICS.2010.5698995
Filename :
5698995
Link To Document :
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