DocumentCode
2305805
Title
Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks
Author
Carbajo, S. ; Brizuela, F. ; Martz, D.H. ; Alessi, D. ; Wang, Y. ; Marconi, M.C. ; Rocca, J.J. ; Menoni, C.S. ; Sakdinawat, A. ; Anderson, E. ; Goldberg, K.A. ; Attwood, D.T. ; La Fontaine, B.
Author_Institution
Dept. of Electr. & Comput. Eng., Colorado State Univ., Fort Collins, CO, USA
fYear
2010
fDate
7-11 Nov. 2010
Firstpage
584
Lastpage
585
Abstract
We have developed a compact aerial full-field microscope based on a table-top 13.2 nm wavelength extreme ultraviolet laser and diffractive optics to characterize the printing performance of EUV lithographic masks.
Keywords
CCD image sensors; light diffraction; optical microscopes; ultraviolet lithography; Mo-Si; at-wavelength characterization; compact aerial full-field microscope; diffractive optics; extreme ultraviolet lithography masks; laser-based aerial microscope; printing performance;
fLanguage
English
Publisher
ieee
Conference_Titel
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location
Denver, CO
ISSN
-
Print_ISBN
978-1-4244-5368-9
Electronic_ISBN
-
Type
conf
DOI
10.1109/PHOTONICS.2010.5699022
Filename
5699022
Link To Document