DocumentCode :
2305902
Title :
Optimization of hot-pressed n-type SbI3-doped Bi2 Te2.85Se0.15 compounds
Author :
See, J.H. ; Ju, M.C. ; Park, K. ; Kim, J.H. ; Lee, C.H.
Author_Institution :
Dept. of Metall. Eng., Inha Univ., Inchon, South Korea
fYear :
1997
fDate :
26-29 Aug 1997
Firstpage :
114
Lastpage :
117
Abstract :
The n-type SbI3-doped Bi2Te2.85Se 0.15 thermoelectric compounds were fabricated by the hot pressing in the temperature range of 380 to 420°C under 100, 150 and 200 MPa in Ar. The transmission electron microscopy, and X-ray diffraction were used to investigate the detailed microstructure. We fabricated relatively dense compounds. The relative density of the compounds fabricated at 420°C was 99.6%. The grains of the compounds were preferentially oriented along the perpendicular to the pressing direction through the hot pressing and also the degree of preferred orientation increased with the hot pressing temperature and pressure. In addition, with increasing the hot pressing temperature, the figure of merit was increased due to the increase in density and preferred orientation. The highest figure of merit (2.35×10-3/K) was obtained at 420°C under 200MPa
Keywords :
X-ray diffraction; antimony compounds; bismuth compounds; hot pressing; semiconductor materials; thermoelectric power; transmission electron microscopy; 100 to 200 MPa; 380 to 420 C; Bi2Te2.85Se0.15:SbI3; X-ray diffraction; figure of merit; hot-pressed n-Bi2Te2.85Se0.15:SbI3; preferentially oriented grains; thermoelectric; transmission electron microscopy; Argon; Bismuth; Electrons; Microstructure; Powders; Pressing; Tellurium; Temperature distribution; Thermal conductivity; Thermoelectricity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermoelectrics, 1997. Proceedings ICT '97. XVI International Conference on
Conference_Location :
Dresden
ISSN :
1094-2734
Print_ISBN :
0-7803-4057-4
Type :
conf
DOI :
10.1109/ICT.1997.666988
Filename :
666988
Link To Document :
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