Title :
Visible filter integrated with an image sensor fabricated by a 90-nm standard CMOS process
Author :
Yoon, Yeo-Taek ; Lee, Sang-Shin ; Lee, Byoung-Su
Author_Institution :
Dept. of Electron. Eng., Kwangwoon Univ., Seoul, South Korea
Abstract :
A visible filter, enabling a homogeneous integration with an image sensor, was demonstrated through an advanced standard 90-nm CMOS process. The overall transmission was as high as about 85% in the visible band.
Keywords :
CMOS image sensors; CMOS process; homogeneous integration; image sensor; size 90 nm; visible filter;
Conference_Titel :
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location :
Denver, CO
Print_ISBN :
978-1-4244-5368-9
DOI :
10.1109/PHOTONICS.2010.5699045
