DocumentCode
2306429
Title
Maskless fabrication of GaN-based light-emitting diodes
Author
Guilhabert, B. ; Richardson, E. ; Massoubre, D. ; Gu, E. ; Watson, I.M. ; Dawson, M.D.
Author_Institution
Inst. of Photonics, Univ. of Strathclyde, Glasgow, UK
fYear
2010
fDate
7-11 Nov. 2010
Firstpage
649
Lastpage
650
Abstract
A versatile maskless process flow was developed to fabricate a GaN-based individually-addressable LED array. This new fabrication approach combines CMOS-controlled micro-LED writing and silver nanoparticle inkjet printing. An array filling factor of 99% was achieved.
Keywords
CMOS integrated circuits; III-V semiconductors; gallium compounds; ink jet printing; light emitting diodes; nanoparticles; optical arrays; optical fabrication; silver; wide band gap semiconductors; CMOS-controlled micro-LED writing; GaN; array filling factor; individually-addressable LED array; light-emitting diodes; maskless fabrication; silver nanoparticle inkjet printing;
fLanguage
English
Publisher
ieee
Conference_Titel
IEEE Photonics Society, 2010 23rd Annual Meeting of the
Conference_Location
Denver, CO
ISSN
-
Print_ISBN
978-1-4244-5368-9
Electronic_ISBN
-
Type
conf
DOI
10.1109/PHOTONICS.2010.5699055
Filename
5699055
Link To Document