DocumentCode :
230691
Title :
Photo-cathode analysis for SwissFEL
Author :
Schaer, M. ; Craievich, Paolo ; Stingelin, L.
Author_Institution :
Paul Scherrer Inst., Villigen, Switzerland
fYear :
2014
fDate :
6-10 July 2014
Firstpage :
174
Lastpage :
175
Abstract :
The SwissFEL facility is currently being built at Paul Scherrer Institut (PSI) and aims at the generation of sub-nanometer X-rays within a pulse duration in the order of 10 fs, by sending a high energy electron beam through undulators [1]. A key parameter to achieve this goal is the transverse brightness B ∝ / I/εr2 of the electron beam at the exit of the injector. A high peak current I and a low transverse emittance εr are required in order for the lasing process to work efficiently.
Keywords :
electron beams; free electron lasers; wigglers; Paul Scherrer Institut; SwissFEL facility; high energy electron beam; lasing process; photo-cathode analysis; pulse duration; sub-nanometer X-rays; transverse emittance; undulators; Cathodes; Copper; Laser beams; Lasers; Radio frequency; Solenoids; Standards;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
Conference_Location :
Engelberg
Print_ISBN :
978-1-4799-5306-6
Type :
conf
DOI :
10.1109/IVNC.2014.6894797
Filename :
6894797
Link To Document :
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