DocumentCode :
230698
Title :
Growth and field emission performance of micro-patterned boron nanowire arrays
Author :
Haibo Gan ; Fei Liu ; Shunyu Jin ; Tongyi Guo ; Shaozhi Deng ; Ningsheng Xu
Author_Institution :
GuangDong Province Key Lab. of Display Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
fYear :
2014
fDate :
6-10 July 2014
Firstpage :
180
Lastpage :
181
Abstract :
Boron nanowire micro-patterns are prepared by CVD method. Ni film is chosen to be the catalyst for fabrication of boron nanowires. Patterned boron nanowires are found to have relatively lower turn-on field and good emission uniformity, which should have a promising future in FED area.
Keywords :
boron; catalysts; chemical vapour deposition; field emission; nanofabrication; nanowires; B; FED area; catalyst; field emission properties; micropatterned boron nanowire arrays; nickel films; Gallium nitride; boron nanowires; field emission; patterned growth; uniformity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
Conference_Location :
Engelberg
Print_ISBN :
978-1-4799-5306-6
Type :
conf
DOI :
10.1109/IVNC.2014.6894800
Filename :
6894800
Link To Document :
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