DocumentCode :
230736
Title :
Improving the topografiner technology down to nanometer spatial resolution
Author :
Zanin, D.A. ; De Pietro, L.G. ; Cabrera, H. ; Kostanyan, A. ; Vindigni, A. ; Pescia, D. ; Ramsperger, U.
Author_Institution :
Lab. for Solid State Phys., ETH Zurich, Zurich, Switzerland
fYear :
2014
fDate :
6-10 July 2014
Firstpage :
141
Lastpage :
142
Abstract :
In Scanning Tunnelling Microscopy (STM) the electrons are confined within the tunneling region, and this limitation has redirected scientists to alternative microscopy techniques, aimed at extracting the electrons away from the tunneling region. The topografiner - strictly speaking a precursor of STM, originally developed at the National Bureau of Standards - is an example. In this paper we report on the latest improvements of the topografiner technology that allow resolving topographic contrast with a lateral resolution down to 7 Å.
Keywords :
scanning tunnelling microscopy; tunnelling; STM; nanometer spatial resolution; scanning tunnelling microscopy; topografiner technology; topographic contrast; tunneling region; Electron beams; Iron; Junctions; Microscopy; Spatial resolution; Surface topography; Tunneling; Field Emission; Secondary Electron; Topografiner;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference (IVNC), 2014 27th International
Conference_Location :
Engelberg
Print_ISBN :
978-1-4799-5306-6
Type :
conf
DOI :
10.1109/IVNC.2014.6894818
Filename :
6894818
Link To Document :
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