Title :
Electron Energy Distributions In Electron Cyclotron Resonance Plasmas for Materials Processing
Author :
Yilin Weng ; Kushner, M.J.
Author_Institution :
University of Illinois
Keywords :
Cyclotrons; Electrons; Plasma density; Plasma devices; Plasma materials processing; Plasma properties; Plasma sheaths; Plasma sources; Plasma temperature; Resonance;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695586
