Title :
Flux Integration In 2D vs. 3D in Feature Evolution Models of Plasma Processing
Author :
Dalvie, M. ; Farouki, R.T. ; Hainaguchi, S.
Author_Institution :
IBM Thomas J. Watson Research Center
Keywords :
Electrons; Equations; Etching; Fabrication; Plasma applications; Plasma materials processing; Plasma sheaths; Plasma simulation; Shadow mapping; Shape;
Conference_Titel :
Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
Conference_Location :
Williamsburg, VA, USA
Print_ISBN :
0-7803-0147-1
DOI :
10.1109/PLASMA.1991.695588
