• DocumentCode
    2308589
  • Title

    A Review Of ECR Plasma Processing Technology

  • Author

    Asmussen, J.

  • Author_Institution
    Michigan State University
  • fYear
    1991
  • fDate
    3-5 June 1991
  • Firstpage
    139
  • Lastpage
    139
  • Keywords
    Electromagnetic launching; Electrons; Etching; Inductors; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Plasma properties; Plasma waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1991. IEEE Conference Record - Abstracts., 1991 IEEE International Conference on
  • Conference_Location
    Williamsburg, VA, USA
  • Print_ISBN
    0-7803-0147-1
  • Type

    conf

  • DOI
    10.1109/PLASMA.1991.695590
  • Filename
    695590
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2308589