DocumentCode
2308691
Title
Enhancement and degradation of drain current in pseudomorphic AlGaAs/InGaAs HEMTs induced by hot-electrons
Author
Canali, Claudio ; Cova, Paolo ; De Bortoli, Eros ; Fantini, Fausto ; Meneghesso, Gaudenzio ; Menozzi, Roberto ; Zanoni, Enrieo
Author_Institution
Dipartimento di Sci. dell´´Ingegneria, Modena Univ., Italy
fYear
1995
fDate
4-6 April 1995
Firstpage
205
Lastpage
211
Abstract
New failure mechanisms induced by hot-electrons in AlGaAs/InGaAs pseudomorphic HEMTs have been identified by means of accelerated testing of commercial devices from four different suppliers. Different degradation modes have been observed, depending on the device type, namely: (a) recoverable increase of I/sub D/ and |V/sub T/|, which has been attributed to recombination of electrons trapped under the gate with holes generated by impact ionization; (b) enhancement of the kink in the output characteristics, possibly due to the generation of deep levels with subsequent electron trapping/detrapping; (c) permanent increase of the breakdown voltage, due to creation of negatively charged traps in the gate-drain region, yielding a wider space-charge region, hence a reduced maximum electric field. The link between the observed degradation modes and the underlying physical mechanisms is investigated by means of different techniques, and the main functional effects of the degradation modes are addressed.
Keywords
III-V semiconductors; aluminium compounds; deep levels; electric breakdown; electron traps; electron-hole recombination; gallium arsenide; high electron mobility transistors; hot carriers; impact ionisation; indium compounds; life testing; semiconductor device reliability; AlGaAs-InGaAs; accelerated testing; breakdown voltage; deep levels; degradation modes; drain current; electron trapping; failure mechanisms; gate-drain region; hot-electrons; impact ionization; maximum electric field; negatively charged traps; output characteristics kink; physical mechanisms; pseudomorphic HEMTs; recombination; space-charge region; Character generation; Charge carrier processes; Degradation; Electron traps; Failure analysis; Impact ionization; Indium gallium arsenide; Life estimation; PHEMTs; Spontaneous emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1995. 33rd Annual Proceedings., IEEE International
Conference_Location
Las Vegas, NV
Print_ISBN
0-7803-2031-X
Type
conf
DOI
10.1109/RELPHY.1995.513676
Filename
513676
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