• DocumentCode
    2308895
  • Title

    On maximizing the compound yield for 3D Wafer-to-Wafer stacked ICs

  • Author

    Taouil, Mottaqiallah ; Hamdioui, Said ; Verbree, Jouke ; Marinissen, Erik Jan

  • Author_Institution
    Fac. of EE, Math. & CS, Delft Univ. of Technol., Delft, Netherlands
  • fYear
    2010
  • fDate
    2-4 Nov. 2010
  • Firstpage
    1
  • Lastpage
    10
  • Abstract
    Three-Dimensional Stacked IC (3D-SIC) is an emerging technology that provides heterogeneous integration, higher performance, and lower power consumption compared to planar ICs. Fabricating these 3D-SICs using Wafer-to-Wafer (W2W) stacking has several advantages including: high throughput, thin wafer and small die handling, and high TSV density. However, W2W stacking suffers from low compound yield. This paper investigates various matching processes by using different wafer matching criteria in order to maximize the compound yield. It first establishes a framework covering different matching processes and wafer matching criteria for both replenished and non-replenished wafer repositories. Thereafter, a subset of the framework is analyzed. The simulation results show that the compound yield not only depends on the number of stacked dies, die yield, and repository size, but it also strongly depends on the used matching process and the wafer matching criteria. Moreover, by choosing an appropriate wafer matching scenario (e.g., wafer matching process, criterion etc.), the compound yield can be improved up to 13.4% relative to random W2W stacking.
  • Keywords
    three-dimensional integrated circuits; 3D wafer-to-wafer stacked IC; TSV density; die handling; heterogeneous integration; nonreplenished wafer repositories; repository size; stacked dies; wafer matching criteria; 3D integration; compound yield; matching criteria; wafer matching; wafer-to-wafer stacking;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Test Conference (ITC), 2010 IEEE International
  • Conference_Location
    Austin, TX
  • ISSN
    1089-3539
  • Print_ISBN
    978-1-4244-7206-2
  • Type

    conf

  • DOI
    10.1109/TEST.2010.5699218
  • Filename
    5699218