DocumentCode :
2309550
Title :
New latchup failure mechanism induced by an elevated via resistance on multilayer CMOS technology
Author :
Chen, Yuan-Chuan Steven ; Hu, Sam ; DeBonis, Tom J.
Author_Institution :
Intel Corp., Chandler, AZ, USA
fYear :
1995
fDate :
4-6 April 1995
Firstpage :
249
Lastpage :
253
Abstract :
A parasitic PNP initiated Vcc latchup failure mechanism was identified as the cause of a blown via contact failure mode. Highly resistive via contacts connecting the underlying N-well substrate to its upper layer Vcc metal bus lines were consistently observed at failing circuits. A defective tungsten (W) plug was determined to be the root cause of the failure mechanism. Based on an established failure model, a circuit simulation was conducted to investigate the impact of via series resistance on latchup triggering current. The contribution of via contact resistance in triggering a latchup mechanism must be considered to maintain high reliability microprocessor products.
Keywords :
CMOS integrated circuits; circuit analysis computing; contact resistance; failure analysis; integrated circuit interconnections; integrated circuit metallisation; integrated circuit reliability; W; blown via contact failure mode; circuit simulation; defective W plug; elevated via resistance; failure model; high reliability microprocessor products; highly resistive via contacts; latchup failure mechanism; latchup triggering current; multilayer CMOS technology; parasitic PNP initiated Vcc latchup failure; underlying N-well substrate; via contact resistance; via series resistance; CMOS technology; Circuit simulation; Circuit testing; Contact resistance; Electric resistance; Failure analysis; Logic testing; Microprocessors; Nonhomogeneous media; Tungsten;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1995. 33rd Annual Proceedings., IEEE International
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-7803-2031-X
Type :
conf
DOI :
10.1109/RELPHY.1995.513687
Filename :
513687
Link To Document :
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