Title :
Boron compounds as a dominant source of alpha particles in semiconductor devices
Author :
Baumann, Robert ; Hossain, Tim ; Murata, Shinya ; Kitagawa, Hideki
Author_Institution :
ULSI Technol. Dev. Center, Texas Instrum. Japan Ltd., Ibaraki, Japan
Abstract :
The interaction of cosmic ray neutrons and boron is demonstrated as the dominant source of alpha particles and other radiations in electronic devices utilizing borophosphosilicate glass (BPSG). A simple process modification is proposed to significantly reduce this intense source of ionizing radiation without compromising the reflow and passivation properties of BPSG.
Keywords :
alpha-particle effects; borosilicate glasses; passivation; phosphosilicate glasses; semiconductor devices; semiconductor technology; B2O3-P2O5-SiO2; BPSG; alpha particles; borophosphosilicate glass; ionizing radiation; passivation properties; process modification; reflow properties; semiconductor devices; soft errors; Alpha particles; Boron; Fabrication; Impurities; Ionizing radiation; Isotopes; Neutrons; Packaging; Radioactive materials; Semiconductor devices;
Conference_Titel :
Reliability Physics Symposium, 1995. 33rd Annual Proceedings., IEEE International
Conference_Location :
Las Vegas, NV
Print_ISBN :
0-7803-2031-X
DOI :
10.1109/RELPHY.1995.513695