• DocumentCode
    2310480
  • Title

    The effect of wafer stress on absorption coefficient and minority carrier diffusion length in cast poly-Si

  • Author

    Hwang, I.G. ; Schroder, D.K. ; Wohlgemuth, J.H.

  • Author_Institution
    Arizona State Univ., Tempe, AZ, USA
  • fYear
    1993
  • fDate
    10-14 May 1993
  • Firstpage
    178
  • Lastpage
    183
  • Abstract
    The surface photovoltage (SPV) technique is an attractive method for measuring the minority carrier diffusion length of solar cells. It has the advantage of not requiring permanent sample contacts. It does require, however, an accurate knowledge of the absorption coefficient-wavelength (α-λ) relationship. This relationship is well known for single-crystal silicon and SPV plots are linear for such materials. However, for polycrystalline silicon, nonlinear SPV plots are frequently found and the authors believe the single-crystal α-λ data not to be applicable. Depending which portion of the plot is used for diffusion length determination, they obtain very different diffusion lengths. By making SPV, short circuit current, and spectral response measurements and comparing theory with experiments, they find a new α-λ relationship that appears to depend on the stress in the sample. They find the low wavelength range of the SPV plots to be most suitable for diffusion length measurements
  • Keywords
    carrier lifetime; elemental semiconductors; minority carriers; semiconductor device models; semiconductor device testing; silicon; solar cells; Si; absorption coefficient; cast poly-Si; measurements; minority carrier diffusion length; polycrystalline; semiconductor; short circuit current; solar cells; spectral response; surface photovoltage technique; wafer stress; Absorption; Current measurement; Data mining; Length measurement; Reflectivity; Short circuit currents; Silicon; Spontaneous emission; Stress; Wavelength measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1993., Conference Record of the Twenty Third IEEE
  • Conference_Location
    Louisville, KY
  • Print_ISBN
    0-7803-1220-1
  • Type

    conf

  • DOI
    10.1109/PVSC.1993.347057
  • Filename
    347057