Title :
High efficiency n-silicon solar cells using rear junction structures
Author :
Dai, X.M. ; Green, M.A. ; Wenham, S.R.
Author_Institution :
Centre for Photovoltaic Devices & Syst., New South Wales Univ., Kensington, NSW, Australia
Abstract :
This paper reports two near junction structures for n-silicon solar cells. They are respectively rear totally- (PERT) and rear locally-diffused (PERL) junction cells. The electrical contacts are deployed on both sides of the cells with n- on the front and p- on the rear, most surface area being passivated by silicon dioxide. A shunt problem in the rear PERL structure, resulting in a low fill factor, has been identified and solved by using the different contact characteristics of PtSi/p-silicon and PtSi/n-silicon. Open-circuit voltages up to 694 mV are obtained for the rear PERT structure, and 696 mV for the PERL. Both of the rear junction n-silicon solar cells have achieved high energy conversion efficiencies of 21.9% and 21.2% respectively. The results were measured at one Sun (0.100 W/cm2 ), global AM 1.5 spectrum, 25°C by Sandia National Laboratories. Some front junction n-silicon cells have also been fabricated to compare with the rear junction cells. The measured results have shown that the open-circuit voltage for the front junction cells is about 34 mV lower than the rear junction cells. The reason for this is discussed
Keywords :
electrical contacts; elemental semiconductors; p-n homojunctions; passivation; semiconductor device testing; silicon; solar cells; 21.2 percent; 21.9 percent; 25 C; 694 mV; 696 mV; PERL; PERT; Si; electrical contacts; energy conversion; fabrication; fill factor; front junction; n-silicon solar cells; open-circuit voltage; passivation; rear junction structures; rear locally-diffused junction; rear totally-diffused junction; semiconductor; shunt problem; Boron; Current density; Energy conversion; Laboratories; P-n junctions; Photovoltaic cells; Photovoltaic systems; Silicon; Solar power generation; Voltage;
Conference_Titel :
Photovoltaic Specialists Conference, 1993., Conference Record of the Twenty Third IEEE
Conference_Location :
Louisville, KY
Print_ISBN :
0-7803-1220-1
DOI :
10.1109/PVSC.1993.347062