• DocumentCode
    2310627
  • Title

    636 mV open circuit voltage multicrystalline silicon solar cells on Polix material: trade-off between short circuit current and open circuit voltage

  • Author

    Ghannam, M.Y. ; Sivoththaman, S. ; Elgamel, H.E. ; Nijs, J. ; Rodot, M. ; Sarti, D.

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    1993
  • fDate
    10-14 May 1993
  • Firstpage
    106
  • Lastpage
    110
  • Abstract
    The trade-off between the open circuit voltage and the short circuit current i.f.o. the base resistivity of multicrystalline silicon (Polix) solar cells (4 cm2) is investigated. Very thin substrates (180 μm) with base resistivities between 0.2 Ω.cm and 2.5 Ω.cm are used in a laboratory high efficiency process (including back surface field, hydrogen and oxide passivation, selective and homogeneous emitters) to test the limits, in terms of open circuit voltage and short circuit current, that can be reached on this material. The variation of VOC and JSC with base doping is established for Polix multicrystalline silicon. On low resistivity substrates (0.2 Ω.cm) a record value of 636 mV is achieved for the open circuit voltage which largely compensates for the relatively small deficit in JSC. The efficiencies of solar cells fabricated on the lower resistivity substrates tend to be greater than those achieved on the higher resistivity material
  • Keywords
    electrical conductivity; elemental semiconductors; passivation; semiconductor device testing; silicon; solar cells; 180 mum; 636 mV; Polix material; Si; back surface field; base doping; base resistivity; efficiency; fabrication; homogeneous emitter; multicrystalline silicon solar cells; open circuit voltage; passivation; selective emitter; semiconductor; short circuit current; substrates; Circuit testing; Conductivity; Hydrogen; Laboratories; Materials testing; Passivation; Photovoltaic cells; Short circuit currents; Silicon; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1993., Conference Record of the Twenty Third IEEE
  • Conference_Location
    Louisville, KY
  • Print_ISBN
    0-7803-1220-1
  • Type

    conf

  • DOI
    10.1109/PVSC.1993.347070
  • Filename
    347070