DocumentCode
2310884
Title
A new double stacked a-Si:H solar cell having the structure pin/TCO/nip
Author
Kusian, W. ; Plattner, R.D. ; Furlan, J. ; Conte, G.
Author_Institution
Corp. Res. & Dev., Siemens AG, Munich, Germany
fYear
1993
fDate
10-14 May 1993
Firstpage
955
Lastpage
959
Abstract
The light-induced degradation (Staebler-Wronski effect) in amorphous silicon pin solar cells can be reduced by using thin i-layers. The conventionally used pin/pin stacked solar cells behave more stable than single junction devices at the same efficiency level. The electrical series connection of these stacked cells exhibits disadvantages owing to the i-layer thicknesses and changes in the solar spectrum. A parallel connected stacked solar cell overcomes these shortcomings. The new stacked solar cell presented here has the structure pin/thin conducting oxide (TCO)/nip and incorporates the electrical parallel connection of the two subcells. In this device structure, the photocurrents generated in the two subcells simply add up. The use of the same material for depositing both junctions promises the equality of photovoltages at the maximum power point. With a suitable patterning by laser scribing, an integrated solar module can be made. Changes in the solar spectrum and in the i-layer thicknesses are tolerable in the new device, thus making the production process simpler
Keywords
Staebler-Wronski effect; amorphous semiconductors; elemental semiconductors; hydrogen; p-n heterojunctions; semiconductor doping; silicon; solar cells; Si:H; Staebler-Wronski effect; double stacked a-Si:H solar cell; electrical parallel connection; laser scribing; light-induced degradation; maximum power point; patterning; photocurrents; photovoltages; pin/TCO/nip; production process; solar spectrum; thin i-layers; Absorption; Amorphous silicon; Degradation; Optical materials; Photoconductivity; Photovoltaic cells; Power generation; Research and development; Solar power generation; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1993., Conference Record of the Twenty Third IEEE
Conference_Location
Louisville, KY
Print_ISBN
0-7803-1220-1
Type
conf
DOI
10.1109/PVSC.1993.347091
Filename
347091
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