DocumentCode :
2311282
Title :
Design of a high fill-factor micromachined bolometer for thermal imaging applications
Author :
Safy, M. ; Zaky, A. Hafz
Author_Institution :
Dept. of Electron., Mil. Tech. Coll., Egypt
fYear :
2010
fDate :
20-22 Oct. 2010
Firstpage :
1
Lastpage :
4
Abstract :
This paper reports a novel design of a microchined bolometer for thermal imaging applications. The thermal modeling and stress analysis of infrared radiation bolometer which is made of a thin film of aSi:H has been performed using FLUENT(6.1) and ANSYS (11) CFD programs respectively. This bolometer is realized in a multilevel electro thermal structure having a high fill factor. Using the multilevel structure, thermal isolation can be independently optimized without sacrificing the IR absorption area. The analysis showed that optimization of the arm dimensions can be done without failure of structure breakdown or buckling. The design shows that the thermal time constant is 12.95 ms, the responsivity is of 4.65×103 V/W, and the detcetivity is of 7.97×108 cm Hz1/2 w-1 which can be achieved in a 50μm×50μm michromachined structure.
Keywords :
amorphous semiconductors; bolometers; buckling; infrared detectors; infrared imaging; optimisation; semiconductor thin films; stress analysis; buckling; fill factor; infrared radiation bolometer; micromachined bolometer; optimization; size 50 mum; stress analysis; structure breakdown; thermal imaging; thermal isolation; thermal modeling; thin film; time 12.95 ms; Amorphous silicon; Bolometers; Computational fluid dynamics; Detectors; Films; Stress; Bolometer-Infreared-Thermal modeling; Stress Analysis-Micromachined-Detectors-FEA;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
Conference_Location :
Taipei
ISSN :
2150-5934
Print_ISBN :
978-1-4244-9783-6
Electronic_ISBN :
2150-5934
Type :
conf
DOI :
10.1109/IMPACT.2010.5699494
Filename :
5699494
Link To Document :
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