Title :
SiO2 - TiO2 Thin Film for Integrated Optics Fabricated by the Sol-Gel Technique
Author :
Lis, Szymon ; Lukowiak, Anna ; Dylewicz, R. ; Patela, S. ; Maruszewski, Krzysztof
Author_Institution :
Photonics Group, Wroclaw Univ. of Technol.
fDate :
June 30 2006-July 2 2006
Abstract :
In this paper the fabrication process and optical measurements of sol-gel SiO2-TiO2 thin films are presented. The first part is devoted to the basics of sol-gel technique, where fabrication of silica-titania films is shortly described. Investigated layers were obtained from three different precursors: tetraethyl orthosilicate (TEOS), tetrabutoxytitanate (TNBT) and titanium isopropoxide (TIPO), mixed in various amounts in order to tailor the refractive index of a layer. Sol-gel films were coated by dip-coating method on silicon substrate with 1 mum SiO2 optical substrate in the first case, and on bare silicon substrate in the second case. Thickness and refractive index of deposited layers was measured at 632.8 nm wavelength by use of ellipsometry. Refractive index dependence of SiO2-TiO2 composition in sol-gel thin film is presented
Keywords :
dip coating; ellipsometry; integrated optics; optical fabrication; optical films; organic compounds; refractive index; silicon; silicon compounds; sol-gel processing; titanium compounds; 632.8 nm; Si; SiO2-TiO2; dip-coating method; ellipsometry; integrated optics fabrication; optical measurements; refractive index; silica-titania thin film; silicon substrate; sol-gel technique; tetrabutoxytitanate; tetraethyl orthosilicate; titanium isopropoxide; Integrated optics; Optical device fabrication; Optical films; Optical refraction; Optical variables control; Refractive index; Silicon; Substrates; Titanium; Transistors;
Conference_Titel :
Photonics and Microsystems, 2006 International Students and Young Scientists Workshop
Conference_Location :
Wroclaw
Print_ISBN :
1-4244-0392-8
Electronic_ISBN :
1-4244-0393-6
DOI :
10.1109/STYSW.2006.343665
