• DocumentCode
    2312032
  • Title

    High spatial resolution subsurface microscopy using radially polarized beam

  • Author

    Yurt, Abdulkadir ; Grogan, Michael D W ; Lu, Yang ; Ramsay, Euan ; Ünlü, M. Selim ; Ramachandran, Siddharth ; Goldberg, Bennett B.

  • Author_Institution
    Photonics Center, Boston Univ., Boston, MA, USA
  • fYear
    2012
  • fDate
    23-27 Sept. 2012
  • Firstpage
    830
  • Lastpage
    831
  • Abstract
    We experimentally study spot size reduction by using radially polarized beam for subsurface silicon integrated circuit microscopy. Metallic lines fabricated on a silicon substrate with linewidth / spacing ~ 130nm / 70nm were resolved through the substrate at λ0 = 1310nm.
  • Keywords
    elemental semiconductors; integrated optics; light polarisation; optical fabrication; optical microscopy; silicon; Si; metallic lines fabrication; radially polarized beam; silicon substrate; spatial resolution subsurface microscopy; spot size reduction; subsurface silicon integrated circuit microscopy; wavelength 1310 nm; Apertures; Image resolution; Laser beams; Microscopy; Optical imaging; Optical polarization; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics Conference (IPC), 2012 IEEE
  • Conference_Location
    Burlingame, CA
  • Print_ISBN
    978-1-4577-0731-5
  • Type

    conf

  • DOI
    10.1109/IPCon.2012.6359251
  • Filename
    6359251
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2312032