• DocumentCode
    2312515
  • Title

    The development and application of ultra thin copper foil

  • Author

    Lie, Y.M. ; Huang, C.C. ; Tsao, P.Y. ; Lira, S.C. ; Chen, K.C.

  • Author_Institution
    Electron. Mater. Div., Nan Ya Plastic Corp., Taipei, Taiwan
  • fYear
    2010
  • fDate
    20-22 Oct. 2010
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    The aim of this study is to introduce the development and application of the ultra copper foil of Nan Ya Plastics Corp. The structure of the NY ultra thin copper foil comprising three parts, that is (1) the supporting foil (2) the release layer and (3) the thin copper foil. The key component of this foil is the release layer which is the four element alloy. It provides a uniform bonding strength which is adequate to prevent separation of the supporting foil and ultra-thin copper foil during handling and lamination. Owing to the low surface roughness and thin thickness, the NY ultra thin foil exhibit the excellent etching performance. Therefore, it especially suitable to apply in the fine circuit pattern application, such as IC substrate. According to the experimental results, the 30μ m line width and 30 μ m line spacing pattern can be achieved by using the ultra thin foil.
  • Keywords
    bonding processes; copper; foils; substrates; surface roughness; thin films; IC substrate; bonding strength; circuit pattern application; etching performance; line spacing pattern; surface roughness; ultra thin copper foil;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
  • Conference_Location
    Taipei
  • ISSN
    2150-5934
  • Print_ISBN
    978-1-4244-9783-6
  • Electronic_ISBN
    2150-5934
  • Type

    conf

  • DOI
    10.1109/IMPACT.2010.5699568
  • Filename
    5699568