DocumentCode
2312515
Title
The development and application of ultra thin copper foil
Author
Lie, Y.M. ; Huang, C.C. ; Tsao, P.Y. ; Lira, S.C. ; Chen, K.C.
Author_Institution
Electron. Mater. Div., Nan Ya Plastic Corp., Taipei, Taiwan
fYear
2010
fDate
20-22 Oct. 2010
Firstpage
1
Lastpage
1
Abstract
The aim of this study is to introduce the development and application of the ultra copper foil of Nan Ya Plastics Corp. The structure of the NY ultra thin copper foil comprising three parts, that is (1) the supporting foil (2) the release layer and (3) the thin copper foil. The key component of this foil is the release layer which is the four element alloy. It provides a uniform bonding strength which is adequate to prevent separation of the supporting foil and ultra-thin copper foil during handling and lamination. Owing to the low surface roughness and thin thickness, the NY ultra thin foil exhibit the excellent etching performance. Therefore, it especially suitable to apply in the fine circuit pattern application, such as IC substrate. According to the experimental results, the 30μ m line width and 30 μ m line spacing pattern can be achieved by using the ultra thin foil.
Keywords
bonding processes; copper; foils; substrates; surface roughness; thin films; IC substrate; bonding strength; circuit pattern application; etching performance; line spacing pattern; surface roughness; ultra thin copper foil;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
Conference_Location
Taipei
ISSN
2150-5934
Print_ISBN
978-1-4244-9783-6
Electronic_ISBN
2150-5934
Type
conf
DOI
10.1109/IMPACT.2010.5699568
Filename
5699568
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