DocumentCode :
2312883
Title :
Nanomembrane transfer printing for MR-VCSELs on silicon
Author :
Chuwongin, Santhad ; Yang, Hongjun ; Seo, Jung-Hun ; Zhao, Deyin ; Shuai, Yichen ; Yang, Weiquan ; Berggren, Jesper ; Hammar, Mattias ; Ma, Zhenqiang ; Zhou, Weidong
Author_Institution :
Dept. of Electr. Eng., Univ. of Texas at Arlington, Arlington, TX, USA
fYear :
2012
fDate :
23-27 Sept. 2012
Firstpage :
951
Lastpage :
952
Abstract :
The authors report an optically pumped Si membrane reflector vertical cavity surface emitting laser (MR-VCSEL), which was built employing low-temperature PDMS nanomembrane transfer printing processes. The lasing cavity consists of a transferred III-V InGaAsP quantum well (QW) heterostructure active region, sandwiched in between two single layer Si photonic crystal (PC) Fano resonance membrane reflectors (SiMRs). Also included in this paper is the simulated optical E-field distribution profile for the designed lasing cavity mode at 1527 nm.
Keywords :
III-V semiconductors; elemental semiconductors; gallium arsenide; indium compounds; laser accessories; laser cavity resonators; membranes; nanophotonics; photonic crystals; printing; quantum well lasers; silicon; surface emitting lasers; InGaAsP-Si; MR-VCSEL; PDMS nanomembrane transfer printing processes; lasing cavity; optical electric field distribution profile; optically pumped silicon membrane reflector; photonic crystal Fano resonance membrane reflectors; quantum well heterostructure; vertical cavity surface emitting laser; wavelength 1527 nm; Cavity resonators; Photonic crystals; Printing; Silicon; Substrates; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics Conference (IPC), 2012 IEEE
Conference_Location :
Burlingame, CA
Print_ISBN :
978-1-4577-0731-5
Type :
conf
DOI :
10.1109/IPCon.2012.6359311
Filename :
6359311
Link To Document :
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