• DocumentCode
    2313291
  • Title

    Interfacial reaction at 250°C in the Sn/Ni-7wt.%V couple

  • Author

    Lin, Yu-ren ; Pan, Kai-wen ; Wu, Hsin-jay ; Chen, Sinn-wen

  • Author_Institution
    Dept. of Chem. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • fYear
    2010
  • fDate
    20-22 Oct. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Sn is the base element of all the promising electronic solders, and Ni-7wt.%V is the major diffusion barrier layer material of flip chip technology. Interfacial reactions in the Sn/Ni-7wt.%V couple at 250°C are examined in this study. The Ni3Sn4 phase is observed in the Sn matrix. Two phase layers, Sn-Ni-V ternary phase (T phase) and a mixture of the nano-crystalline V2Sn3 phase and Sn phase (T2 phase), are observed at the Sn/Ni-7wt.%V interface. The micro structures of T phase and T2 phase was analyzed by TEM, T phase has a dense structure and T2 phase has a loose structure. The loose structure of Sn-V phase can not only cause a harmful effect on mechanical properties, but also on electrical properties.
  • Keywords
    diffusion; flip-chip devices; electrical properties; electronic solders; flip chip technology; interfacial reactions; loose structure; major diffusion barrier layer material; mechanical properties; microstructures; nanocrystalline phase; phase layers; ternary phase; Mechanical factors; Nickel; Substrates; Tin; Transmission electron microscopy; Interfacial reactions; Ni-7wt.%V; Sn; V2Sn3; ternary phase;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
  • Conference_Location
    Taipei
  • ISSN
    2150-5934
  • Print_ISBN
    978-1-4244-9783-6
  • Electronic_ISBN
    2150-5934
  • Type

    conf

  • DOI
    10.1109/IMPACT.2010.5699617
  • Filename
    5699617