DocumentCode :
2313780
Title :
Temperature effects on electromigration behavior of solder joints
Author :
Ke, Jia-Hong ; Kao, C. Robert
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2010
fDate :
20-22 Oct. 2010
Firstpage :
1
Lastpage :
4
Abstract :
Void formation, intermetallic compound dissolution and metallization consumption at cathode interface are major degradation processes of electromigration in solder joints, but decisive factors for the phenomena are not clear. The article provides a new perspective to describe the electromigration behavior. We analyzed the temperature effects on Cu and Sn electromigration fluxes in Sn. The calculated result showed low temperature retards Sn electromigration flux by three orders of magnitude more effectively than Cu, which implied intermetallic compound dissolution and metallization consumption at cathode will be the dominant feature at low temperature. The calculated result was verified by low temperature electromigration tests in flip chip solder joint.
Keywords :
cathodes; electromigration; flip-chip devices; metallisation; solders; cathode interface; degradation process; electromigration behavior; electromigration flux; electromigration tests; flip chip solder joint; intermetallic compound dissolution; low temperature retards; metallization consumption; solder joints; temperature effects; void formation; Cathodes; Copper; Current density; Electromigration; Intermetallic; Metallization; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems Packaging Assembly and Circuits Technology Conference (IMPACT), 2010 5th International
Conference_Location :
Taipei
ISSN :
2150-5934
Print_ISBN :
978-1-4244-9783-6
Electronic_ISBN :
2150-5934
Type :
conf
DOI :
10.1109/IMPACT.2010.5699647
Filename :
5699647
Link To Document :
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