DocumentCode :
2314415
Title :
Focussed ion beam milling of silica microspheres
Author :
Kane, D.M. ; Chate, R.J. ; McPhail, D.S.
Author_Institution :
Dept. of Phys. & Astron., Macquarie Univ., Sydney, NSW, Australia
fYear :
2010
fDate :
12-15 Dec. 2010
Firstpage :
109
Lastpage :
110
Abstract :
Focussed ion beam milling, combined with secondary ion and secondary electron imaging, has been used to evaluate the internal homogeneity of silica glass microspheres. Internal inhomogeneities that will result in non-uniform optical properties are found. The method is demonstrated as suitable for evaluating internal optical quality of the silica microspheres qualitatively. Basic studies to determine whether differences in chemical composition can be differentiated from density differences and topological contouring are required before the technique can be evaluated for more quantitative application.
Keywords :
chemical analysis; focused ion beam technology; micromachining; milling; optical glass; optical properties; secondary electron emission; secondary ion emission; silicon compounds; SiO2; chemical composition differences; density differences; focussed ion beam milling; internal homogeneity; internal optical quality evaluation; nonuniform optical properties; quantitative application; secondary electron imaging; secondary ion imaging; silica glass microspheres; silica microspheres; topological contouring; Integrated optics; Lasers; Optical imaging; Optical propagation; Photonics; Silicon compounds; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices (COMMAD), 2010 Conference on
Conference_Location :
Canberra, ACT
ISSN :
1097-2137
Print_ISBN :
978-1-4244-7334-2
Electronic_ISBN :
1097-2137
Type :
conf
DOI :
10.1109/COMMAD.2010.5699684
Filename :
5699684
Link To Document :
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