DocumentCode
2314415
Title
Focussed ion beam milling of silica microspheres
Author
Kane, D.M. ; Chate, R.J. ; McPhail, D.S.
Author_Institution
Dept. of Phys. & Astron., Macquarie Univ., Sydney, NSW, Australia
fYear
2010
fDate
12-15 Dec. 2010
Firstpage
109
Lastpage
110
Abstract
Focussed ion beam milling, combined with secondary ion and secondary electron imaging, has been used to evaluate the internal homogeneity of silica glass microspheres. Internal inhomogeneities that will result in non-uniform optical properties are found. The method is demonstrated as suitable for evaluating internal optical quality of the silica microspheres qualitatively. Basic studies to determine whether differences in chemical composition can be differentiated from density differences and topological contouring are required before the technique can be evaluated for more quantitative application.
Keywords
chemical analysis; focused ion beam technology; micromachining; milling; optical glass; optical properties; secondary electron emission; secondary ion emission; silicon compounds; SiO2; chemical composition differences; density differences; focussed ion beam milling; internal homogeneity; internal optical quality evaluation; nonuniform optical properties; quantitative application; secondary electron imaging; secondary ion imaging; silica glass microspheres; silica microspheres; topological contouring; Integrated optics; Lasers; Optical imaging; Optical propagation; Photonics; Silicon compounds; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Optoelectronic and Microelectronic Materials and Devices (COMMAD), 2010 Conference on
Conference_Location
Canberra, ACT
ISSN
1097-2137
Print_ISBN
978-1-4244-7334-2
Electronic_ISBN
1097-2137
Type
conf
DOI
10.1109/COMMAD.2010.5699684
Filename
5699684
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