• DocumentCode
    2314415
  • Title

    Focussed ion beam milling of silica microspheres

  • Author

    Kane, D.M. ; Chate, R.J. ; McPhail, D.S.

  • Author_Institution
    Dept. of Phys. & Astron., Macquarie Univ., Sydney, NSW, Australia
  • fYear
    2010
  • fDate
    12-15 Dec. 2010
  • Firstpage
    109
  • Lastpage
    110
  • Abstract
    Focussed ion beam milling, combined with secondary ion and secondary electron imaging, has been used to evaluate the internal homogeneity of silica glass microspheres. Internal inhomogeneities that will result in non-uniform optical properties are found. The method is demonstrated as suitable for evaluating internal optical quality of the silica microspheres qualitatively. Basic studies to determine whether differences in chemical composition can be differentiated from density differences and topological contouring are required before the technique can be evaluated for more quantitative application.
  • Keywords
    chemical analysis; focused ion beam technology; micromachining; milling; optical glass; optical properties; secondary electron emission; secondary ion emission; silicon compounds; SiO2; chemical composition differences; density differences; focussed ion beam milling; internal homogeneity; internal optical quality evaluation; nonuniform optical properties; quantitative application; secondary electron imaging; secondary ion imaging; silica glass microspheres; silica microspheres; topological contouring; Integrated optics; Lasers; Optical imaging; Optical propagation; Photonics; Silicon compounds; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials and Devices (COMMAD), 2010 Conference on
  • Conference_Location
    Canberra, ACT
  • ISSN
    1097-2137
  • Print_ISBN
    978-1-4244-7334-2
  • Electronic_ISBN
    1097-2137
  • Type

    conf

  • DOI
    10.1109/COMMAD.2010.5699684
  • Filename
    5699684