Polarization and phase sensitive normal incidence multiple quantum well light modulator with 7000:1 contrast

Author

Shen, H. ; Pamulapati, J. ; Wraback, M. ; Taysing-Lara, M. ; Dutta, M. ; Kuo, H.C. ; Lu, Y.

Author_Institution

Electron. & Power Sources Directorate, US Army Res. Lab., Fort Monmouth, NJ, USA

fYear

1993

fDate

5-8 Dec. 1993

Firstpage

209

Lastpage

212

Abstract

A multiple quantum well modulator was fabricated using epitaxial lift-off techniques and bonded to a transparent substrate which possesses a direction-dependent thermal expansion coefficient. The modulator utilized the quantum confined Stark effect to tune the phase retardation and polarization rotation created by the thermally induced in-plane anisotropic strain. A contrast ratio of 7000:1 was achieved in an electrically controlled multiple quantum well light modulator.<>

Keywords

Stark effect; birefringence; electro-optical devices; light polarisation; optical modulation; semiconductor epitaxial layers; semiconductor quantum wells; birefringence; contrast ratio; direction-dependent thermal expansion coefficient; electrically controlled light modulator; epitaxial lift-off techniques; multiple quantum well modulator; phase retardation; phase sensitive light modulator; polarization rotation; quantum confined Stark effect; thermally induced in-plane anisotropic strain; transparent substrate; Anisotropic magnetoresistance; Bonding; Capacitive sensors; Lighting control; Optical polarization; Phase modulation; Potential well; Stark effect; Substrates; Thermal expansion;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1993. IEDM '93. Technical Digest., International

Conference_Location

Washington, DC, USA

ISSN

0163-1918

Print_ISBN

0-7803-1450-6

Type

conf

DOI

10.1109/IEDM.1993.347368

Filename

347368