Title :
A 50-MeV mm-wave electron linear accelerator system for production of tunable short wavelength synchrotron radiation
Author :
Nassiri, A. ; Kustom, R.L. ; Mills, F.E. ; Kang, Y.W. ; Feinerman, A.D. ; Henke, H. ; Matthews, P.J. ; Willke, T.L. ; Grudzien, D. ; Song, J. ; Horan, D.
Author_Institution :
Accel. Syst. Div., Argonne Nat. Lab., IL, USA
Abstract :
The Advanced Photon Source (APS) at Argonne in collaboration with the University of Illinois at Chicago and the University of Wisconsin at Madison is developing a new millimeter wavelength, 50-MeV electron linear accelerator system for production of coherent tunable wavelength synchroton radiation. Modern micromachining techniques based on deep etch x-ray lithography, LIGA (Lithografie, Galvanoforming, Abformung), capable of producing high-aspect ratio structures are being considered for the fabrication of the accelerating components.<>
Keywords :
electron accelerators; linear accelerators; microwave generation; synchrotron radiation; 50 MeV; Advanced Photon Source; LIGA; accelerating components; coherent tunable wavelength synchroton radiation; deep etch X-ray lithography; fabrication; high-aspect ratio structures; micromachining; millimeter wavelength electron linear accelerator; Acceleration; Collaboration; Electrons; Etching; Fabrication; Linear accelerators; Micromachining; Millimeter wave technology; Production systems; X-ray lithography;
Conference_Titel :
Electron Devices Meeting, 1993. IEDM '93. Technical Digest., International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-1450-6
DOI :
10.1109/IEDM.1993.347373
